Assessment and Investigation of the Pd Nanoparticles-Assisted Chemical Etching of Silicon for Ethanol Solution Electrooxidation

The formation of porous silicon in HF/H2O2/H2O solution by Pd nanoparticles-assisted chemical etching of single-crystal Si with resistivity = 0.01 Ω.cm was tested at 25 °C, 50 °C and 75 °C. Via optical and scanning electron microscopy and gravimetric analysis,

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